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发明名称
CVD METHOD AND DEVICE FOR FORMING SILICON-CONTAINING INSULATION FILM
摘要
申请公布号
KR100903484(B1)
申请公布日期
2009.06.18
申请号
KR20047007468
申请日期
2003.01.14
申请人
发明人
分类号
H01L21/318;C23C16/30;C23C16/34;C23C16/40;C23C16/452;H01L21/205;(IPC1-7):H01L21/318
主分类号
H01L21/318
代理机构
代理人
主权项
地址
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