| 摘要 |
<p>In the method for manufacturing electrical resistors, use is made of a metal foil (1) fixed to an insulating support, and on the said foil (1) is applied a mask (4) containing furrows (5) whose edges (6) correspond to the contour of the electric resistant circuit to be etched on the said foil (1). Said circuit is etched by placing the assembly consisting of the mask (4), the foil (1) and the support in an ion beam having kinetic energy greater than the bonding energy of the atoms constituting the mask (4) and the foil (1). Application to the production of electrical resistors of high ohmic value per unit area, to thermometric probes and to strain gauges. <IMAGE></p> |
