发明名称 CLOSELY SPACED IC CONTACT STRUCTURE AND MANUFACTURE
摘要 <p>Inverted frustum shaped polycrystalline semiconductor layers are formed on the emitter and collector regions provided for one surface of a semiconductor substrate, and conductor layers are applied on the upper surfaces of the polycrystalline semiconductor surfaces to form emitter and collector electrodes thus providing a bipolar transistor for the integrated circuit device.</p>
申请公布号 CA1042559(A) 申请公布日期 1978.11.14
申请号 CA19760257488 申请日期 1976.07.21
申请人 NIPPON TELEGRAPH AND TELEPHONE PUBLIC CORPORATION 发明人 SAKAI, TETSUSHI
分类号 H01L21/3205;H01L21/225;H01L21/28;H01L21/285;H01L21/306;H01L21/314;H01L21/331;H01L23/532;H01L29/417;H01L29/43;H01L29/73;(IPC1-7):01L29/40;01L21/74 主分类号 H01L21/3205
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