| 摘要 |
PURPOSE:To obtain a photoelectric converter in which a defect such as scratch, dirt or stepwise disconnection of a photoconductive film is not produced but good characteristics are provided by depositing the photoconductive film with a metal mask, heat treating it for activation without isolating the film, employing a resist film such as photovarnish which is used at the etching time to protect each process and the etching step as a final step. CONSTITUTION:Photoconductive films 22, 22' are deposited in a strip shape on a glass substrate 21 in a main scanning direction with a metal mask 23, the substrate 21, on which the film 22 is formed, is removed from a depositing device, and an activating step is immediately performed in a clean state. A positive resist is coated on the entire surface, only a part to be attached with an electrode is exposed, and the resist is removed. Subsequently, an electrode NiCr, Au are entirely deposited, and dipped in an acetone. The NiCr, Au on the part, on which the resist remains, are isolated from the substrate due to the solution of the resist, thereby forming common electrode 24 and individual electrodes 24' which have desired electrode pattern. Eventually, the part 25 between the photoreceptor and the electrode 24' and the part 26 between the blocks of the electrode 24 are dry etched with the photoresist as a mask so as to isolate the strip film 22 into each bit. |
