发明名称 GAS WIPING PLATING EQUIPMENT
摘要 PURPOSE:To damp the oscillation of a strip during transfer and stabilize the strip by adjusting the thickness of the hot dipped strip with air wipers and sending the strip to the next process through air pads in which plural press. chamber are connected with each other via a through hole.
申请公布号 JPS53127332(A) 申请公布日期 1978.11.07
申请号 JP19770041393 申请日期 1977.04.13
申请人 HITACHI LTD 发明人 SHIMONO MASATOSHI
分类号 B05C11/06;C23C2/16;C23C2/20 主分类号 B05C11/06
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