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发明名称
FOTOLACK FUER ROENTGENSTRAHLENLITHOGRAPHIE
摘要
申请公布号
DE2817426(A1)
申请公布日期
1978.11.02
申请号
DE19782817426
申请日期
1978.04.21
申请人
DEUTSCHE ITT INDUSTRIES GMBH
发明人
HERBERT HEINECKE,RUDOLF AUGUST
分类号
C08F20/00;C08F20/32;G03F7/038;G03F7/039;G03F7/20;H01L21/027;(IPC1-7):G03C1/71
主分类号
C08F20/00
代理机构
代理人
主权项
地址
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