发明名称 |
Silver halide vapor deposition method |
摘要 |
There are disclosed a method and an apparatus for the production of photographic materials by vacuum deposition of silver halides on a continuously moving substrate. The silver halides are heated in a crucible placed within a vacuum chamber by radiant heating means disposed outside the chamber and the crucible is so shaped and positioned so close to the continuously moving substrate that a stream of silver halide vapour impinges perpendicularly on the substrate and silver halide is deposited on the substrate at a rate of 200 to 2000 A/sec. The substrate is usually primed with a layer of a material which enhances deposition of the silver halide thereon. The use of the photographic material thus produced in the production of direct positive and negatively emitting photographic materials is described.
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申请公布号 |
US4123280(A) |
申请公布日期 |
1978.10.31 |
申请号 |
US19750586429 |
申请日期 |
1975.06.12 |
申请人 |
ZLAFOP PRI BAN |
发明人 |
MALINOVSKI, YORDAN P.;MEDNIKAROV, BORISLAV D.;ASSA, JAKOB J. |
分类号 |
G03C1/496;(IPC1-7):G03C1/02;C23C13/00;B05B13/06;C03C5/00 |
主分类号 |
G03C1/496 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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