PHOTOMASK MANUFACTURING METHOD, LITHOGRAPHY APPARATUS, PHOTOMASK INSPECTING METHOD, PHOTOMASK INSPECTING APPARATUS, AND DISPLAY DEVICE MANUFACTURING METHOD

摘要

Provided is a method of fabricating a photomask which can improve the precision of the coordinates of a pattern to be formed on a substrate. The method of fabricating a photomask of the present invention comprises: a process for preparing pattern design data A; a process for preparing thickness distribution data T which represents the thickness distribution of a wafer; a process for preparing transfer surface shape data C which represents the shape of a primary surface when a photomask is mounted on an exposure apparatus; a process for obtaining drawing difference data F by using the thickness distribution data T and the transfer surface shape data C; a process for obtaining drawing coordinate displacement data G by computing coordinate displacement amounts with respect to multiple points on the primary surface, corresponding to the drawing difference data F; and a drawing process for drawing on a photomask blank by using the drawing coordinate displacement amount data G and the pattern design data A.