Exposure apparatus, method of controlling the same, and alignment method for exposure

摘要

An exposure apparatus capable of preventing a reduction in its accuracy due to, for example, the influence of aging or the influence of heat is disclosed. Also disclosed is a method of controlling the same, and an alignment method for exposure. In one aspect, the exposure apparatus includes a main stage for adjusting a position of a substrate, a beam irradiation unit for irradiating a beam onto a mask, and a beam monitoring unit having a position fixed with respect to the main stage, and for recognizing the beam emitted from the beam irradiation unit and passed through one pattern of the mask.

主权项

1. An exposure apparatus, comprising:
a main stage configured to adjust the position of a substrate, the substrate having an alignment key; a mask stage configured to adjust the position of a mask, the mask having an alignment mark; an alignment configured to check the position of the alignment key; an alignment mark monitoring unit configured to check the position of the alignment mark; a beam irradiation unit configured to irradiate a beam of light onto a mask; a beam monitoring unit having a position fixed with respect to the main stage, and configured to recognize the beam emitted from the beam irradiation unit and passed through openings in the mask so as to form a particular pattern, the beam monitoring unit being separated from the alignment mark monitoring unit; and a control unit configured to output a substrate position adjustment signal indicative of the position of the main stage so as to adjust the position of the substrate to account for changes in alignment of an optical unit in the beam irradiation unit or transformation of a frame due to heat generated during exposure, even though the substrate is accurately positioned with respect to the alignment key monitoring unit and the mask is accurately positioned with respect to the alignment mark monitoring unit.