| 摘要 |
PURPOSE:To improve sensitivity and resolution of the above pattern forming material by incorporating a specified silanol compd. and a silanol precursor for generating acid into the material. CONSTITUTION:A silanol compd. (A) having in average >= one OH group bonded to an Si atom, and a precursor (B) generating an acid by the irradiation with active chemical rays, are contained in the subject pattern forming material. Cis(1,3,5,7-tetrahydroxy)-1,3,5,7-tetraphenyl cyclotetrasiloxane, etc., is used as the component (A), and an onium salt such as trifluoromethane sulfonic acid triphenyl sulfonium is used as the component (B). It is also preferred that an alkali-soluble resin (e.g. m-cresol-novolak resin) is contained in the pattern forming material. |
