发明名称 |
Magnetic deflection apparatus positioned behind target |
摘要 |
An improved fine deflection, for use in an electron beam optical system, utilizes a magnetic deflector positioned adjacent to the surface of the target most remote from a matrix lens, which is positioned between the target and an electron beam emitter. The matrix lens is a single plate having multiple apertures forming matrix lenslets and has an electron beam accelerator positioned between the lens and the target for uniform acceleration of the electron beam passing through a selected one of the lenslets.
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申请公布号 |
US4122369(A) |
申请公布日期 |
1978.10.24 |
申请号 |
US19770839331 |
申请日期 |
1977.10.04 |
申请人 |
GENERAL ELECTRIC COMPANY |
发明人 |
HUGHES, WILLIAM C.;PARKS, HAROLD G. |
分类号 |
H01J29/76;H01J29/80;H01J31/60;(IPC1-7):H01J29/72 |
主分类号 |
H01J29/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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