发明名称 Magnetic deflection apparatus positioned behind target
摘要 An improved fine deflection, for use in an electron beam optical system, utilizes a magnetic deflector positioned adjacent to the surface of the target most remote from a matrix lens, which is positioned between the target and an electron beam emitter. The matrix lens is a single plate having multiple apertures forming matrix lenslets and has an electron beam accelerator positioned between the lens and the target for uniform acceleration of the electron beam passing through a selected one of the lenslets.
申请公布号 US4122369(A) 申请公布日期 1978.10.24
申请号 US19770839331 申请日期 1977.10.04
申请人 GENERAL ELECTRIC COMPANY 发明人 HUGHES, WILLIAM C.;PARKS, HAROLD G.
分类号 H01J29/76;H01J29/80;H01J31/60;(IPC1-7):H01J29/72 主分类号 H01J29/76
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