发明名称 PROCESS FOR TREATING STACK GASES OR THE LIKE
摘要 <p>The invention is apparatus in which stack gases containing pollutant gases and particulate matter are passed through a defined substantially horizontal flow path into which at least one selected liquid reagent is introduced in a prescribed manner to contact intimately the stack gases therein. The liquid reagent scrubs the stack gases and thereby removes a substantial portion of the pollutant gases and particulate matter therefrom. In contrast to vertical tower scrubbers, one reagent may be used or several different reagents may be employed at different stages of the horizontal flow path to effect best removal of various different pollutants contained within the stack gases. Removal of sulfur dioxide may be accomplished by a highly reactive and substantially non-abrasive reagent, such as a lime solution and such solution further effects removal of materials in trace amounts in the stack gases such as mercury, beryllium and vanadium. Removal of nitric oxide and other materials in trace amounts may also be accomplished by a process which includes as a reagent an oxidant.</p>
申请公布号 CA1040840(A) 申请公布日期 1978.10.24
申请号 CA19740211401 申请日期 1974.10.15
申请人 WEIR, ALEXANDER (JR.) 发明人 WEIR, ALEXANDER (JR.)
分类号 B01D47/06;(IPC1-7):01D47/06 主分类号 B01D47/06
代理机构 代理人
主权项
地址