| 发明名称 |
PHOTOSENSITIVE SOLUTION FOR FORMING CIRCUIT BY LIGHT EXPOSURE |
| 摘要 |
PURPOSE:To eliminate the defects of a Sn<2>+ -hydrochloric acid series forming a metalic pattern directly by photochemical reaction, and to improve photosensitivity and resolution, by adding Sn<4>+ to this series. |
| 申请公布号 |
JPS53120519(A) |
申请公布日期 |
1978.10.21 |
| 申请号 |
JP19770034572 |
申请日期 |
1977.03.30 |
| 申请人 |
HITACHI LTD |
发明人 |
MATSUO AKIRA;OKA HITOSHI;NAKAMURA KENJI |
| 分类号 |
H05K3/18;G03C1/725;H01L21/027 |
主分类号 |
H05K3/18 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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