Vacuum depositing atomiser control system - has vacuum vessel pressure adjusted dependent upon voltage between substrate table and target

摘要

The control system for an atomiser having a substrate table, and a vacuum vessel containing a target. The pressure in the vessel (1) may be adjusted dependent upon the voltage between target (3) and table (2). The vessel is connected to a vacuum pump (7), and via a control valve (9), to a gas supply pipe (10). The voltage between target and table is supplied via the voltage divider (11) of a control unit (12), which is connected to the valve. The voltage is a high voltage, caused by a high frequency gas discharge.