| 摘要 |
1529037 Photo-sensitive materials having chalcogenide layers NIPPON TELEGRAPH & TELEPHONE PUBLIC CORP 3 June 1977 [8 June 1976 12 Nov 1976] 23768/77 Heading G2C An image-forming material comprises a substrate 6 having a radiation sensitive chalcogenide coating 4 comprising a layer of silver 3 superimposed on an amorphous layer 2 of selenium and germanium containing 75 to 95 mol % Se and 5 to 25 mol % Ge. The material is exposed to light or an electron beam 7 to give silver doped amorphous regions 8 in the exposed areas. The silver layer and undoped amorphous layer are removed by etchants e.g. aqua regia and alkali respectively, to leave the doped regions. The masked substrate can then be etched e.g. using concentrated acid, and finally the mask is removed using alkali. The Se and Ge are deposited by sputtering and the silver from a solution containing silver irons. The substrate may be glass, silicon, optionally coated with silicon oxide, silicon nitride or aluminium.
|
