发明名称 METHODS OF MAKING VAPOUR DEPOSITION MASKS
摘要 1528295 Vapour-deposition masks INTERNATIONAL BUSINESS MACHINES CORP 25 April 1977 [28 July 1976] 17019/77 Heading B6C A vapour-deposition mask 10, Fig. 1, is formed integrally with a thin web portion 20 carrying the pattern, e.g. thin openings 12 between strips 18 having little inherent rigidity, together with reinforcing rib(s) 14 which are recessed significantly at points where they bridge the openings so that there is a passage supplied for the vapourized material and the presence of the ribs does not hinder the deposition of the pattern. Generally the masks are formed from a block of material by etching, machining or sand blasting, the ribs being formed by removal of major amounts of material from one side, the pattern and the recesses 22 in the ribs 14 being formed subsequently from the other side.
申请公布号 GB1528295(A) 申请公布日期 1978.10.11
申请号 GB19770017019 申请日期 1977.04.25
申请人 IBM CORP 发明人
分类号 H05K3/14;C23C14/04;C23C14/24;C23C14/34;C23C14/50;G09F9/30;(IPC1-7):23C13/08 主分类号 H05K3/14
代理机构 代理人
主权项
地址