| 发明名称 |
ELECTRON BEAM EXPOSURE METHOD |
| 摘要 |
PURPOSE:To accurately control the size of resist pattern, by constituting the resist with two layer coating of high and low sensitivity. |
| 申请公布号 |
JPS53114676(A) |
申请公布日期 |
1978.10.06 |
| 申请号 |
JP19770028602 |
申请日期 |
1977.03.17 |
| 申请人 |
TOKYO SHIBAURA ELECTRIC CO |
发明人 |
JINNO KIYOKATSU |
| 分类号 |
G03F7/26;H01L21/027;H01L21/26 |
主分类号 |
G03F7/26 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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