| 摘要 |
PURPOSE:To prevent corner parts of a rectangular part from forming a thick connection even when a diffraction generates at the time of exposure or when a deformation generates after developing where the connecting part becomes thick by forming a light shielding part in between the corner parts, in an area which corresponds with the rectangular part coming into contact at the corner part of an exposure mask. CONSTITUTION:The pattern forming method is carried out by corresponding the light shielding range 1 of the exposure mask to a part to be eliminated by developing a negative type resist, and then the range 1 is formed by making a light shielding film on a surface of a transparent glass substrate, etc. Further, it is made to correspond with the rectangular part to remain after development of the negative type resist of a light transmitting range 2, and the area between the range 2 corresponding to one rectangular part of the negative type resist and the range 2 corresponding to another rectangular part connecting with the rectangular part at the corner part are shielded by a light shielding part 3. This light shielding part 3 is formed integrally with the light shielding range 1, and the width W of the light shielding part 3 is made less than the resist resolution limit to eliminate the generation of a space between the rectangular parts in contact with the corner part of the negative resist pattern. |
