| 摘要 |
<p>This invention relates to a process for the manufacture of compounds of the formula I wherein X represents an oxygen or sulphur atom, R1 represents a hydrogen atom or lower alkyl group, R6' represents a halogen atom or a lower alkyl, lower alkoxy , lower alkylthio, lower alkylsulphonyl, di(lower alkyl) sulphamoyl, hydroxy, benzyloxy, trimethylsilyloxy, trifluoromethyl, nitro, amino or di(lower alkyl) amino group and R7' and R8' each individually represents a hydrogen atom or a substituent denoted by R6', which comprises reacting a compound of the formula II wherein X, R1, R6', R7' and R8' have the above meanings and R3 is hydrogen or trimethylsilyl, with a dehydration agent and cleaving off a trimethylsilyl group R3 present by treatment with a hydrolysing agent in the presence of metal ions. The dibenzo ¢b,f! thiepin and dibenz ¢b,f! oxepin derivatives of formula I are useful as starting materials for the manufacture of dibenzo ¢b,f! thiepin and dibenz ¢b,f! oxepin derivatives which form the subject matter of our copending Canadian Application for Letters Patent No. 201,871.</p> |
