发明名称 CHEMICAL PLATING METHOD IN GAS PHASE
摘要 PURPOSE:To plate uniform and smooth film rapidly, inexpensively, and easily by supplying reaction gas contg. gas phase plating material to a material to be plated contained in a reaction tube at least in two directions, and by increasing or decreasing the gas quantity in each direction periodically with total gas quantity maintained at nearly constant.
申请公布号 JPS53106392(A) 申请公布日期 1978.09.16
申请号 JP19770020168 申请日期 1977.02.28
申请人 NISSAN MOTOR 发明人 IKEZAWA KENJI;KOMATSU MIKIYA;ANDOU MOTOHIDE
分类号 C23C16/44;C23C16/455 主分类号 C23C16/44
代理机构 代理人
主权项
地址