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发明名称
PATTERN FORMATION METHOD
摘要
PURPOSE:A desired high-molecule resin layer is formed on the substrate via the thin layer of amino silane, polysilazane or cyclo polysilazane of a fixed constitutional respectively. Thus, a micropattern can be formed.
申请公布号
JPS53105980(A)
申请公布日期
1978.09.14
申请号
JP19770020213
申请日期
1977.02.28
申请人
HITACHI LTD
发明人
HONMA YOSHIO;YAMANAKA ICHISUKE;NOZAWA HISAO;HARADA YUKIYOSHI
分类号
H01L21/306;H01L21/027;H01L21/302
主分类号
H01L21/306
代理机构
代理人
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