| 摘要 |
Compounds are disclosed of the formula <IMAGE> and <IMAGE> wherein R1 is hydrogen, halogen or trifluoromethyl; R2 is selected from the group consisting of lower alkylthio together with the sulfoxide and sulfone thereof, halo, lower alkylamino or lower alkoxy; Y is oxo or thio; R3 is selected from the group consisting of hydrogen, -COOR4 wherein R4 is hydrogen or lower alkyl, -CONR6R5 wherein R5 and R6 are hydrogen or lower alkyl; X is hydrogen or halogen; and R7 is lower alkyl or hydrogen and the pharmaceutically acceptable salts and N-oxides thereof. |
