| 摘要 |
<p>1523535 Self-supporting masks INTERNATIONAL BUSINESS MACHINES CORP 9 June 1976 [30 June 1975] 23760/76 Heading G2X A self-supporting mask for use in electron beam exposing apparatus is made by a) forming a non- self supporting mask on a substrate, the mask being opaque and the substrate transparent to a given radiation; b) increasing the thickness of the mask by a process which includes coating the mask with a resist layer sensitive to the given radiation, exposing the resist through the substrate, developing and finally c) removing the thickened mask from the substrate. If the resist is positive working the thickened mask comprises hardened resist whereas if it is negative working the mask comprises metal layers, which have been plated using the resist as a plating mask.</p> |
