| 发明名称 |
PREPARATION OF PHOTOMASK |
| 摘要 |
PURPOSE:To prepare photomask for transfer pattern of magnetic valve memory tip having precise size of cap between patterns by preparing reticle by exposing parts except transfer pattern part. |
| 申请公布号 |
JPS53100497(A) |
申请公布日期 |
1978.09.01 |
| 申请号 |
JP19770014569 |
申请日期 |
1977.02.15 |
| 申请人 |
KOGYO GIJUTSUIN |
发明人 |
NISHIDA HIDEKI;YOSHIZAWA SHIGERU;SAITOU NOBUO;SUGITA YUTAKA;HOUKOU MORIHISA;HIRAI MICHIO;TANABE ISAO |
| 分类号 |
G11C11/14;G03F1/00;G03F1/68;G03F1/76;H01F10/00;H01F41/14 |
主分类号 |
G11C11/14 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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