| 摘要 |
<p>METHOD FOR MAKING THIN FILM TUNGSTEN-THORIUM ALLOY A thin film tungsten-thorium alloy is fabricated by a method using an electroplating technique. A conductive substrate is situated in a heated plating bath and forms the cathode of the electrical system. The plating bath comprises a first aqueous solution consisting of WO3, Na3PO4 and H2O. The thin film of tungsten-thorium alloy is formed by concurrently passing electrical current through the heated plating bath containing the substrate and adding a second aqueous solution consisting of Th(SO4)2 and H2O to the first solution at a predetermined rate. In some applications, the W-Th alloy subsequently remains as a layer on the object on which it is deposited. In other applications, it is subsequently completely or partially removed from the object. Also, in applications where it is desired to have the W-Th alloy in a single crystal state, it is subsequently annealed.</p> |
