| 发明名称 |
METHOD OF MAKING AN EMBOSSED PATTERN ON AN INFORMATION BEARING SUBSTRATE |
| 摘要 |
<p>An improved process for forming an embossed pattern through the use of a writting concentrated beam opening holes in a film capable of undergoing residue free evaporation. A layer of photoresist is overlayed with the film and upon being exposed and processed the layer supplies the prospective embossed pattern.</p> |
| 申请公布号 |
CA1036859(A) |
申请公布日期 |
1978.08.22 |
| 申请号 |
CA19740190410 |
申请日期 |
1974.01.17 |
| 申请人 |
THOMSON - CSF |
发明人 |
PICQUENDAR, JEAN E.;MARCHAL, MICHEL;DUBOIS, JEAN C.;DUDA, EUGENE |
| 分类号 |
B23K26/00;G03F1/00;G11B7/00;G11B7/0045;G11B7/243;G11B7/253;G11B7/26;(IPC1-7):03C1/00;03C5/00 |
主分类号 |
B23K26/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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