发明名称 |
Plating method for memory elements |
摘要 |
A method for electroplating in a single electroplating bath comprising varying the electric current density so that a non-magnetic plated film and a ferromagnetic plated film are selectively deposited. To achieve this effect the electroplating bath must contain at least about 1 g/l NaH2PO2.H2O.
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申请公布号 |
US4108739(A) |
申请公布日期 |
1978.08.22 |
申请号 |
US19770786926 |
申请日期 |
1977.04.12 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
TADOKORO, EIICHI;KITAMOTO, TATSUJI |
分类号 |
C25D3/56;C25D5/10;(IPC1-7):C25D3/56;C25D5/14 |
主分类号 |
C25D3/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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