Trivalent chromium electroplating baths and method

摘要

An aqueous trivalent chromium plating bath having low temperature stability comprising trivalent chromium ions preferably in a concentration of at least 0.2 M, sulphate ions preferably in a concentration of at least 0.3 M, a weak complexing agent for the chromium ions in a concentration of at least 0.1 M, and fluoride ions in a concentration of at least 0.025 M. The bath preferably also contains chloride ions in a concentration of at least 0.1 M.