发明名称 パターン形成方法及び露光用マスク
摘要 According to one embodiment, a pattern formation method includes preparing a mask pattern for interference, producing Talbot interference, and forming a pattern by blocking a part of interference light. The mask pattern for interference is arranged periodically a plurality of light transmissive portions. The Talbot interference is based on a transmitted light. The transmitted light is transmitted through the light transmissive portions by applying a light to the mask pattern for interference. The part of interference light is produced by the Talbot interference by means of a mask pattern for light blocking and applying another part of the interference light transmitted through the mask pattern for light blocking to an exposure object member.
申请公布号 JP5943886(B2) 申请公布日期 2016.07.05
申请号 JP20130170794 申请日期 2013.08.20
申请人 株式会社東芝 发明人 佐藤 隆;稲浪 良市;伊藤 信一;田中 聡
分类号 G03F7/20;G03F1/00 主分类号 G03F7/20
代理机构 代理人
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