发明名称 SPUTTERING APPARATUS
摘要 PURPOSE:To carry out stable sputtering and to produce good thin film on substrate, by equipping continuously formed base board, be able to transfer the substrate between left and right vacuum space room and moreover, providing the surface of base board facing parallel to the target.
申请公布号 JPS5391083(A) 申请公布日期 1978.08.10
申请号 JP19770005942 申请日期 1977.01.24
申请人 HITACHI LTD 发明人 ITOU TATSU
分类号 C23C14/56 主分类号 C23C14/56
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