发明名称 POSITIVE TYPE RADIATION SENSITIVE MATERIAL
摘要 PURPOSE:To improve adhesion to a substrate, to enhance radiation sensitivity, and to enable a fine and high precision pattern or the like to easily be formed, by using a dehydration polycondensation product from HCHO and a specified compound having active hydrogen.
申请公布号 JPS5387720(A) 申请公布日期 1978.08.02
申请号 JP19770002587 申请日期 1977.01.13
申请人 TOKYO SHIBAURA ELECTRIC CO 发明人 MIYAMURA MASATAKA
分类号 G03F7/039;G03C1/72;H01L21/027;H01L21/312 主分类号 G03F7/039
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