发明名称 Method and apparatus for lapping or polishing materials
摘要 Wafers to be processed are mounted to a lapping plate of a lapping machine using a photosensitive thermoplastic material, such as a photoresist. In a preferred embodiment, the wafers are laminated to a dry film photopolymer disposed on a carrier sheet, after which the sheet is secured to the lapping plate using a pressed-fit hoop that stretches the carrier sheet across the surface of the lapping plate and holds the sheet secure about the perimeter of the plate.
申请公布号 US4104099(A) 申请公布日期 1978.08.01
申请号 US19770763451 申请日期 1977.01.27
申请人 INTERNATIONAL TELEPHONE AND TELEGRAPH CORPORATION 发明人 SCHERRER, RAYMOND E.
分类号 B24B37/04;G03F7/00;H01L21/302;(IPC1-7):B32B31/00 主分类号 B24B37/04
代理机构 代理人
主权项
地址