| 摘要 |
PURPOSE:To prevent the generation of a defective working caused by the ununiformalization of the development state of a polishing material by performing polishing while vibrating each polishing sheet, the carrier interposed by each polishing sheet and a work by a specific high frequency. CONSTITUTION:Lapping plates 5, 6 are rotated. In this case, the vibration by an electromagnet 16 is applied on the whole lapping plates 5, 6 including motors 1, 2 and the polishing material easy to cause an ununiform development at the rotation time of the lapping plates 5, 6 is uniformly dispersed. Consequently, the max. standstill friction force between a carrier 8 and the lapping plates 5, 6 is reduced and the force grinding a crystal blank sheet 10 is uniformized on the contact face. |
