发明名称 ADDITIVE FOR IMPROVED ELECTROPLATING PROCESS
摘要 ADDITIVE FOR IMPROVED ELECTROPLATING PROCESS This invention relates to a process and composition for the preparation of an electro-deposit which contains; at least one metal selected from the group consisting of nickel and cobalt or; binary or ternary alloys of the metals selected from nickel, iron, and cobalt; which comprises passing current from an anode to a cathode through an aqueous acidic electroplating solution containing at least one member selected from nickel compounds and cobalt compounds and which may additionally contain iron compounds providing nickel, cobalt and iron ions for electrodepositing nickel, cobalt, nickelcobalt alloys, nickel-iron alloys, cobalt-iron alloys or nickel-iron-cobalt alloys; the improvement comprising the presence of 5 x 10-6 moles per liter to 0.5 mole per liter of an unsaturated cyclosulfone exhibiting the following generalized structural formula: wherein R1, R2, R3 and R4 are independently hydrogen, lower alkyl, or hydroxyl; for a time period sufficient to form a metal electroplate upon said cathode.
申请公布号 ZA7705315(B) 申请公布日期 1978.07.26
申请号 ZA19770005315 申请日期 1977.09.02
申请人 M & T CHEMICALS INC 发明人 HARBULAK E
分类号 C25D3/18;C25D3/56 主分类号 C25D3/18
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