| 发明名称 |
RADIATION SENSITIVE MATERIAL |
| 摘要 |
PURPOSE:To cause the title material to have high sensitivity to radiation and to easily form a minute and highly precise pattern or the like, by allowing methacrylonitrile to copolymerrize with a monomer capable of becoming a positive type radiation sensitive high polymer. |
| 申请公布号 |
JPS5381114(A) |
申请公布日期 |
1978.07.18 |
| 申请号 |
JP19760156927 |
申请日期 |
1976.12.25 |
| 申请人 |
TOKYO SHIBAURA ELECTRIC CO |
发明人 |
MIYAMURA MASATAKA |
| 分类号 |
G03F7/039;G03C1/72;H01L21/027;H01L21/312 |
主分类号 |
G03F7/039 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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