发明名称 |
ANTIMICROBIAL COMPOSITION AND COSMETIC |
摘要 |
PURPOSE:To obtain an antimicrobial composition suitable for cosmetic compounding a reduced amount of paraben, having low irritation and safety without lowering antiseptic, antimicrobial and sterilizing effects by blending paraben with pionin. CONSTITUTION:An antimicrobial composition and cosmetic having low irritation containing pionin and paraben. The blending ratio is preferably 0.001-0.005wt.% pionin and 0.02-0.1wt.% paraben. The amount of paraben blended can be reduced to about 1/10, the composition or cosmetic has no problems of solubility and yet has antimicrobial power. Use of both the components shows sufficiently antimicrobial and sterilizing effects on cosmetic contaminating microorganisms. |
申请公布号 |
JPH02215706(A) |
申请公布日期 |
1990.08.28 |
申请号 |
JP19890037413 |
申请日期 |
1989.02.16 |
申请人 |
NIPPON KANKO SHIKISO KENKYUSHO:KK |
发明人 |
HAYAMIZU MASAAKI;NAKAGAWA YOSHINORI;SEYA MASAAKI;HARA HIROSHI |
分类号 |
A61K31/235;A61K8/00;A61K8/30;A61K8/33;A61K8/49;A61K47/14;A61K47/22;A61P31/04 |
主分类号 |
A61K31/235 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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