发明名称 CIRCUITO INTEGRATO DI ALTE PRESTAZIONI E PROCEDIMENTO PER LA FABBRICAZIONE DI ESSO.
摘要 The invention disclosed herein is a high performance inverter circuit using MOSFETs having varying threshold voltages produced by selectively varying ion implantation doses in the channels of the MOSFETs and using a slightly depletion type MOSFET, rather than a conventional depletion type, in the output stage.
申请公布号 IT7825818(D0) 申请公布日期 1978.07.17
申请号 IT19780025818 申请日期 1978.07.17
申请人 MOSTEK CORP. 发明人
分类号 H01L21/8236;H01L21/8234;H01L21/8238;H01L27/088;H01L27/092;H01L29/78;H03K19/017;H03K19/08;H03K19/0944;(IPC1-7):H01L/ 主分类号 H01L21/8236
代理机构 代理人
主权项
地址