| 发明名称 |
LIFTTOFF METHOD |
| 摘要 |
PURPOSE:To carry out a good-quality lift-off by forming a positive resist pattern on a transparent substrate and putting in the light of the photosensitive wavelength region of the resist form the transparent substrate side after formation of the resist and a thin film on the substrate. |
| 申请公布号 |
JPS5380994(A) |
申请公布日期 |
1978.07.17 |
| 申请号 |
JP19760156232 |
申请日期 |
1976.12.27 |
| 申请人 |
TOKYO SHIBAURA ELECTRIC CO |
发明人 |
MASHITA MASAO;SEKIKAWA KAZUE |
| 分类号 |
H01B5/00;H01B13/00;H01L21/302;H01L21/306;H01L21/3205;H01L21/768;H01L29/74;H01L29/84;H01L41/00;H01L41/22;H01L45/00;H03H3/08;H03H9/00;H05K3/02;H05K3/06 |
主分类号 |
H01B5/00 |
| 代理机构 |
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代理人 |
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| 地址 |
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