| 摘要 |
PURPOSE:To enable desired development to be attained with good developability by developing a photosensitive material containing a diazo resin having anions, such as PF6<->, BF4<-> organic anions, or a mixture of them, with a specified developer. CONSTITUTION:The photosensitive layer formed on a substrate contains the diazo resin having anions, such as PF6<->, BF4<->, organic anions, or a mixture of them, and an alkali soluble and swellable polymer compound. This photosensitive material is developed with the developer having a pH of >=2.0 at 25 deg.C and substantially not containing an organic solvent, thus permitting problems caused by the use of the organic solvents to be solved and desired development to be attained with good developability. |
