发明名称 Method for fabricating a photoreceptor
摘要 There is described a method for forming a photoreceptor wherein a substrate having a thin electrically insulating oxide film on a surface thereof is subjected to an electroless deposition step from a selenious acid solution whereby the oxide film is dissolved and a thin selenium layer is formed on the substrate. In one embodiment, a relatively thick photoconductive insulating layer comprising selenium or alloys thereof is deposited by vacuum evaporation over the previously electrolessly deposited selenium layer. In another embodiment, a layer of a charge carrier transport material is deposited over the selenium layer. In a preferred embodiment of the invention, an oxide-free substrate is initially subjected to an electrochemical oxidation step in an alkaline medium to form a thin electrically insulating oxide film on the surface thereof.
申请公布号 US4098655(A) 申请公布日期 1978.07.04
申请号 US19770836125 申请日期 1977.09.23
申请人 XEROX CORPORATION 发明人 WARD, ANTHONY T.;TENEY, DONALD J.;ISHLER, JAMES M.;DAMJANOVIC, ALEKSANDAR
分类号 G03G5/043;G03G5/082;(IPC1-7):G03G5/05;C25D11/34 主分类号 G03G5/043
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