发明名称 MANUFACTURE OF COMPOUND SEMICONDUCTOR DEVICE
摘要 PURPOSE:To enhance the high frequency property by securing a high resistance value at the surface layer and a low resistance value on the internal surface respectively with injection of the impurity ion into a compound semiconductor layer featuring a high resistance value and then by forming a sudden impurity concentration slope between the high and low resistance value.
申请公布号 JPS5374383(A) 申请公布日期 1978.07.01
申请号 JP19760151128 申请日期 1976.12.15
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 UMEBACHI SHIYOUTAROU;NAGASHIMA ATSUSHI;KANOU KOUTA
分类号 H01L29/872;H01L29/47 主分类号 H01L29/872
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