| 摘要 |
<p>A process for removing residual monomer from styrene based polymers is disclosed which comprises adding a sulfonylhydrazide having the general formula: <IMAGE> where: R1 is H or an alkyl radical containing 1 to 4 carbon atoms; R2is H or a -SO2-NH-NH2, in which case R1 is H; and symmetric sulfonylhydrazides of the general formulae: <IMAGE> or <IMAGE> where: X is -O-, -S-, -CH2- or -SO2- and mixtures thereof to the polymer resin. Products made by adding the hydrazides to the resins are also disclosed.</p> |
