发明名称 WAFER REFFERNGE METHOD ON PROJECTIVE EXPOSURE
摘要 PURPOSE:To cause a wafer exposure surface to intersect a light axis at a right angle accurately by fixing the wafer between a reference surface support and vacuum chuck inside a projective exposure unit through a chip chuck having the groove, in which a convex inevitably produced at the semiconductor wafer circumference is fallen, provided and a ring spacer. In which a convex inevitably produced at the semiconductor wafer circumference is fallen, provided and a ring spacer.
申请公布号 JPS5373079(A) 申请公布日期 1978.06.29
申请号 JP19760149633 申请日期 1976.12.13
申请人 FUJITSU LTD 发明人 IGARASHI KOUJI;MAJIMA NIWAJI;ORIHARA NAOTAKE
分类号 H01L21/30;H01L21/027;H01L21/68 主分类号 H01L21/30
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