| 摘要 |
1516003 Semi-conductor wafer SIEMENS AG 5 May 1976 [9 May 1975] 18304/76 Heading G2X A wafer for use in the manufacture of a semiconductor component by an electron-beam lithographic process comprises a semi-conductor substrate carrying an electron-sensitive lacquer layer, the wafer having at least one mark for adjusting its position with respect to an electron-beam, the mark being in the form of a recess extending through the electron-sensitive lacquer in to the substrate, the base of the recess being covered with the lacquer at its width being 0À2 to 5 Á and not greater than its depth. Preferably there is an intermediate layer (e.g. Si O 2 Si 3 N 4 or gold) between the substrate and the lacquer and the mark is formed by a resist/ etching process before the lacquer is applied. |
