| 摘要 |
1516044 Resist-mask process INTERNATIONAL BUSINESS MACHINES CORP 13 April 1976 [9 June 1975] 15072/76 Heading G2X A patterned resist mark on a substrate surface is made by (a) forming on the surface a layer of resist material having openings through which the planar surface regions of the substrate are exposed, and (b) flowing the resist material to substantially reduce the area of the openings but not completely close them. Preferably step (a) is effected using a photo-sensitive or electron-beam sensitive material, and step (b) using solvent vapour. |
