发明名称 |
Ion implanted Schottky barrier diode |
摘要 |
A Schottky barrier diode having a subsurface metalsemiconductor rectifying barrier with electrical rectification properties immune to semiconductor surface contamination. A special ion implantation technique is used to produce a very thin but strongly metallic island-like region in a semiconductive body. A Schottky barrier separates the region from the semiconductive body below the semiconductor body surface. A special truncated Gaussian profile in metal concentration through the thickness of the region provides low thermal and electrical resistance between the Schottky barrier and the region surface.
|
申请公布号 |
US4096622(A) |
申请公布日期 |
1978.06.27 |
申请号 |
US19770759324 |
申请日期 |
1977.01.14 |
申请人 |
GENERAL MOTORS CORPORATION |
发明人 |
MACIVER, BERNARD A. |
分类号 |
H01L21/265;H01L21/285;H01L29/167;H01L29/47;H01L29/872;(IPC1-7):B01J7/00 |
主分类号 |
H01L21/265 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|