PRODUCTION OF PLANOGRAPHIC PLATE

摘要

PURPOSE:To obtain a superior planographic plate under conditions for suppressing an organic solvent problem to minimum by developing a photosensitive planographic plate containing a diazo compound and a copolymer having specified structural units with an aqueous alkaline solution in a pH of >=12 substantially not containing any organic solvent. CONSTITUTION:The photosensitive planographic plate provided on a support with a photosensitive layer contains the diazo compound and the copolymer having the structural units each represented by formula I in which each of R<1> and R<2> is H, or methyl; R<3> is a >=2 C hydrocarbon group; X is a divalent group joining 0 with C; Y is a radical polymerization initiator residue; n is 0 or 1; and m is an integer of >=2, the plate is developed with the aqueous alkaline solution in a pH of >=12 substantially not containing any organic solvent after exposing, thus permitting a superior planographic plate to be obtained under the conditions suppressing the problems due to the use of organic solvents to the minimum.