| 发明名称 |
ALIGNING DEVICE OF SEMICONDUCTOR WAFER AND EXPOSURE MASK |
| 摘要 |
PURPOSE:To increase the contrast of patterns and perform alignment with high accuracy by making variable the incident light of illuminating light in the alignment of a wafer and an exposure mask. |
| 申请公布号 |
JPS5364477(A) |
申请公布日期 |
1978.06.08 |
| 申请号 |
JP19760139559 |
申请日期 |
1976.11.22 |
| 申请人 |
TOKYO SHIBAURA ELECTRIC CO |
发明人 |
SHIMAZAKI KUNIYA |
| 分类号 |
H01L21/30;G03F9/00;G05D3/12;H01L21/027;H01L21/68;H05K3/06 |
主分类号 |
H01L21/30 |
| 代理机构 |
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代理人 |
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| 地址 |
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