发明名称 |
PROTECTIVE LAYER FOR PHOTOSENSITIVE ELEMENTS AND METHOD |
摘要 |
<p>On a photographic element comprising at least one heat-processable, photographic layer, a protective layer comprising certain carboxylic polyesters provides improved resistance to abrasion and fingerprinting, resistance to reticulation and surface cracking without adversely affecting sensitomeric properties of the photographic element upon processing. A latent image in such an element can be developed by uniformly heating the element containing the protective layer. Silica particles in the protective layer can enhance resistance of the protective layer to sticking to a heated metal surface and further enable the layer to glide smoothly over the heated metal surface.</p> |
申请公布号 |
CA1031617(A) |
申请公布日期 |
1978.05.23 |
申请号 |
CA19740204153 |
申请日期 |
1974.07.05 |
申请人 |
EASTMAN KODAK COMPANY |
发明人 |
HAMB, FREDRICK L.;HILLER, GARY L.;WISE, ALBERT W. |
分类号 |
G03C1/498;G03C1/76 |
主分类号 |
G03C1/498 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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