发明名称 METHOD FOR THE PRODUCTION OF SEMICONDUCTOR DEVICES
摘要 1509227 Semi-conductor devices SEMIKRON GES FUR GLEICHRICHTERBAU UND ELEKTRONIK mbH 15 May 1975 [30 July 1974] 20500/75 Heading H1K In a method of applying a protective layer 4 to cover the edge surfaces of semi-conductor wafers 3 where at least one PN junction emerges, a plurality of wafers are adhered to raised portions 1alpha of a metallic support 1 with a heatsoftenable plastics material 2; the layer 4 is then applied and allowed to harden, and, with the embedded wafers 3, it is removed from the support 1 by heating to soften the plastics coat 2. The layer 4 may be in a continuous band so that the wafers can receive further treatment, e.g. attachment of contacts and leads, in a production line. The coating 2 may comprise a polyethylene wax which softens at 80-150‹ C., and the layer 4 may be of silicone rubber with a dyestuff additive. After adhesion of the wafer to the raised portions 1alpha, but before application of the layer 4, the edges of the wafers are cleaned by etching.
申请公布号 GB1509227(A) 申请公布日期 1978.05.04
申请号 GB19750020500 申请日期 1975.05.15
申请人 SEMIKRON GLEICHRICHTERBAU 发明人
分类号 H01L21/56;H01L21/31;H01L23/29;H01L23/31;(IPC1-7):01L25/04;01L21/469 主分类号 H01L21/56
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